US Patent Issued to KLA on Jan. 27 for "Overlay estimation based on optical inspection and machine learning" (Israeli, American Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,744, issued on Jan. 27, was assigned to KLA Corp. (Milpitas, Calif.).

"Overlay estimation based on optical inspection and machine learning" was invented by Nireekshan K. Reddy (Tel Aviv, Israel), Arvind Jayaraman (New Hudson, Mich.), Stilian Ivanov Pandev (Santa Clara, Calif.), Amnon Manassen (Haifa, Israel), Boaz Ophir (Haifa, Israel), Udi Shusterman (Ramat Rachel, Israel) and Nadav Gutman (Zichron Ya'aqov, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "One or more optical images of a portion of a semiconductor wafer are obtained. The one or more optical images show a first structure in a first process layer and a second structure in a secon...