US Patent Issued to KLA on Jan. 20 for "High contrast imaging in bonded sample metrology using oblique illumination" (Israeli, American Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,878, issued on Jan. 20, was assigned to KLA Corp. (Milpitas, Calif.).

"High contrast imaging in bonded sample metrology using oblique illumination" was invented by Shlomo Eisenbach (Kfar Pines, Israel), Yoav Grauer (Haifa, Israel), Motti Penia (Migdal Ha'emek, Israel), Andrew V. Hill (Sunriver, Ore.), Avner Safrani (Misgav, Israel) and Arkady Simkin (Migdal Ha'emek, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "An illumination system for dark-field imaging may include one or more illumination sources providing temporally incoherent light with a first spatial profile, and two or more lens assemblies configured to direct the light from the one...