US Patent Issued to KLA on Feb. 3 for "High resolution profile measurement based on a trained parameter conditioned measurement model" (California, Michigan Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,540, issued on Feb. 3, was assigned to KLA Corp. (Milpitas, Calif.).

"High resolution profile measurement based on a trained parameter conditioned measurement model" was invented by Stilian Ivanov Pandev (Santa Clara, Calif.) and Arvind Jayaraman (New Hudson, Mich.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for measurements of semiconductor structures based on a trained parameter conditioned measurement model are described herein. The shape of a measured structure is characterized by a geometric model parameterized by one or more conditioning parameters and one or more non-conditioning parameters. A trained parameter condition...