ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,339, issued on Dec. 9, was assigned to KLA Corp. (Milpitas, Calif.).
"High resolution, multi-electron beam apparatus" was invented by Xinrong Jiang (Palo Alto, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "For an electron beam system, a Wien filter is in the path of the electron beam between a transfer lens and a stage. The system includes a ground electrode between the Wien filter and the stage, a charge control plate between the ground electrode and the stage, and an acceleration electrode between the ground electrode and the charge control plate. The system can be magnetic or electrostatic."
The patent was filed on Aug. 25, 2021, under Ap...