ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,831, issued on Dec. 30, was assigned to KLA Corp. (Milpitas, Calif.).
"Robust and accurate overlay target design for CMP" was invented by Vladimir Levinski (Migdal HaEmek, Israel), Yoel Feler (Haifa, Israel) and Mark Ghinovker (Yoqneam Ilit, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system may receive a plurality of candidate design variations of a target layout of an overlay target. A metrology system may determine one or more process-induced target defects for the plurality of candidate design variations when fabricated with a known fabrication process. A metrology system may determine one or more process-induced overlay er...