ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,380,367, issued on Aug. 5, was assigned to KLA Corp. (Milpitas, Calif.).

"Metrology in the presence of CMOS under array (CuA) structures utilizing machine learning and physical modeling" was invented by Houssam Chouaib (San Jose, Calif.), Zhaxylyk Kudyshev (Milpitas, Calif.), Chao Chang (Milpitas, Calif.) and Derrick A. Shaughnessy (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system may include a controller including processors configured to execute program instructions causing the processors to implement a measurement recipe by: generating a transformation model for transforming full loop optical measurement data to short loop opti...