US Patent Issued to KLA on Aug. 5 for "Methods and systems for measurement of semiconductor structures with multi-pass statistical optimization" (California, Washington Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,668, issued on Aug. 5, was assigned to KLA Corp. (Milpitas, Calif.).

"Methods and systems for measurement of semiconductor structures with multi-pass statistical optimization" was invented by John J. Hench (Los Gatos, Calif.) and Daniel J. Haxton (Lake Forest Park, Wash.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for measuring physical properties of a specimen by iterative solution of an optimization function including both current and prior measurement information are described herein. In one aspect, a Maximum A Posteriori (MAP) estimation approach is employed to integrate prior measurement information with current measuremen...