US Patent Issued to KLA Coporation on Jan. 20 for "Measurements of semiconductor structures based on spectral differences at different process steps" (Chinese, American Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,710, issued on Jan. 20, was assigned to KLA Coporation (Milpitas, Calif.).

"Measurements of semiconductor structures based on spectral differences at different process steps" was invented by Ming Di (Milpitas, Calif.), Qiang Zhao (Milpitas, Calif.), Tianhao Zhang (Shanghai), Dawei Hu (Shanghai), Yih Chang (Shanghai) and Xi Chen (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and systems for measuring values of one or more parameters of interest, including changes in values of one or more parameters of interest, based on measured spectral differences are presented herein. A trained spectral difference based measurement model determin...