ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,007, issued on Sept. 9, was assigned to KIOXIA Corp. (Tokyo).
"Measurement device and measurement method" was invented by Takaki Hashimoto (Kanagawa, Japan) and Hiroyuki Tanizaki (Aichi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement device includes an analyzer configured to analyze a diffraction image of X-rays scattered from a subject; estimate a surface contour shape of a measurement area of the subject; extract feature data from shape information, and determine shape parameters for representing the surface contour shape; calculate a theoretical scattering intensity of each of the scattered X-rays when values of the shape par...