ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,449,736, issued on Oct. 21, was assigned to Kioxia Corp. (Tokyo).
"Measurement apparatus and measurement method" was invented by Kentaro Kasa (Kariya Aichi, Japan), Soichi Inoue (Yokkaichi Mie, Japan), Satoshi Tanaka (Yokohama Kanagawa, Japan) and Hiroyuki Tanizaki (Nagoya Aichi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement apparatus which measures a relative positional displacement amount of a partial pattern to another pattern in a complex pattern on a surface of an object, includes: a measurement part to measure two-dimensional intensity distributions having a first and a second two-dimensional intensity distribution, the first ...