ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,472,533, issued on Nov. 18, was assigned to Kioxia Corp. (Tokyo).
"Impurity recovery device and impurity recovery method" was invented by Jiahong Wu (Yokkaichi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An impurity recovery device according to the present embodiment may recover impurities present on a surface of a substrate. The substrate may be placed on a stage. A sprayer may spray a recovery liquid toward the substrate along a direction from a side of a central part of the substrate to a side of the end part of the substrate. A recovery portion may recover the recovery liquid from the end part of the substrate."
The patent was filed on Se...