US Patent Issued to Kioxia on May 13 for "Polishing solution, polishing apparatus, and polishing method" (Japanese Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,499, issued on May 13, was assigned to Kioxia Corp. (Tokyo).

"Polishing solution, polishing apparatus, and polishing method" was invented by Mikiya Sakashita (Nagoya Aichi, Japan) and Yukiteru Matsui (Nagoya Aichi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polishing solution according to an embodiment includes an exothermic agent that generates heat through application of an alternating magnetic field thereto, and a viscosity modifier that undergoes a reversible phase transition between a gel state and a sol state depending on temperature."

The patent was filed on Sept. 10, 2021, under Application No. 17/447,343.

*For further informat...