ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,661, issued on May 13, was assigned to Kioxia Corp. (Tokyo).
"Mask design method and storage medium thereof" was invented by Taiki Kimura (Kawasaki, Japan) and Tetsuaki Matsunawa (Fujisawa, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment, a mask design method includes the following configuration. The method includes setting evaluation points on a circuit pattern created based on design data, setting a parameter that defines a shape of the mask pattern on the mask pattern corresponding to the circuit pattern and calculating an optical image intensity on the evaluation points set on the circuit pattern based on the mas...