US Patent Issued to KIOXIA on March 25 for "Template, method for fabricating template, and method for fabricating semiconductor device" (Japanese Inventor)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,663, issued on March 25, was assigned to KIOXIA Corp. (Tokyo).

"Template, method for fabricating template, and method for fabricating semiconductor device" was invented by Toshiaki Komukai (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A template includes: a base material having a principal surface; a mesa structure provided on the principal surface and having a first surface; and a silicon film that is provided on the first surface of the mesa structure, has a projection-and-depression pattern, and is made of a material different from a material for the base material."

The patent was filed on Aug. 11, 2021, under Application No. ...