US Patent Issued to Kioxia on June 10 for "Pattern forming method, combined processing apparatus, and recording medium" (Japanese Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,660, issued on June 10, was assigned to Kioxia Corp. (Tokyo).

"Pattern forming method, combined processing apparatus, and recording medium" was invented by Noriko Sakurai (Yokohama Kanagawa, Japan) and Kosuke Takai (Yokohama Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment, a pattern forming method includes forming an organic film on a processing target material, the organic film comprising a convex part and a remaining film part adjacent to the convex part and thinner than the convex part. The method further includes irradiating the organic film with an electron beam to decrease a dry etching rate of the or...