ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,483, issued on Jan. 27, was assigned to KIOXIA Corp. (Tokyo).
"Semiconductor device" was invented by Tetsu Morooka (Yokkaichi Mie, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes first conductive layers stacked in a first direction; a semiconductor film extending in the first direction; a first electrode film disposed between a corresponding one of the first conductive layers and the semiconductor film, and extending in a second direction; and a first insulating film disposed between the first conductive layer and the first electrode film. The first insulating film includes a first portion extending along a first...