US Patent Issued to KIOXIA on Dec. 30 for "Imprint apparatus, pattern forming method, and method of manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,833, issued on Dec. 30, was assigned to KIOXIA Corp. (Tokyo).

"Imprint apparatus, pattern forming method, and method of manufacturing semiconductor device" was invented by Masaki Mitsuyasu (Kuwana Mie, Japan), Anupam Mitra (Yokkaichi Mie, Japan) and Ryo Ogawa (Mie Mie, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An imprint apparatus includes: a chuck including a temperature controller configured to adjust a temperature of a substrate having a shot region, the chuck configured to hold the substrate; a template stage configured to hold a template so that a surface of the template with a pattern faces the substrate and configured to change a r...