US Patent Issued to KIOXIA on Aug. 19 for "Semiconductor manufacturing apparatus for improved uniformity of semiconductor coating with transfer arm and position detector working in combination" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,394,649, issued on Aug. 19, was assigned to KIOXIA Corp. (Tokyo).

"Semiconductor manufacturing apparatus for improved uniformity of semiconductor coating with transfer arm and position detector working in combination" was invented by Junji Tokunaga (Yokkaichi Mie, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor manufacturing apparatus includes a substrate storage unit configured to store a semiconductor wafer W, a substrate processing unit including a rotation holding unit configured to rotate the semiconductor wafer W while holding the semiconductor wafer W, and a coating liquid supply unit configured to supply a coating liquid ont...