US Patent Issued to Kioxia on April 8 for "Template, manufacturing method of template, and manufacturing method of semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,271,111, issued on April 8, was assigned to Kioxia Corp. (Tokyo).

"Template, manufacturing method of template, and manufacturing method of semiconductor device" was invented by Takahiro Iwasaki (Yokohama Kanagawa, Japan), Hirokazu Miyoshi (Kamakura Kanagawa, Japan), Shogo Aso (Yokohama Kanagawa, Japan) and Masayuki Hatano (Yokohama Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment, an imprint template includes a substrate having a first surface and a mesa part protruding from the first surface. The mesa part has a second surface with a pattern thereon. The mesa part includes a sloped region. The sloped region is ...