ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,382,695, issued on Aug. 5, was assigned to KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY (Thuwal, Saudi Arabia).

"Self-forming nanogap method and device" was invented by Thomas D. Anthopoulos (Thuwal, Saudi Arabia), Kalaivanan Loganathan (Thuwal, Saudi Arabia), Emre Yarali (Thuwal, Saudi Arabia), Emre Yengel (Thuwal, Saudi Arabia) and Hendrik Andreas Faber (Thuwal, Saudi Arabia).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a solid state device with a self-forming nanogap includes patterning a first metallic layer (M1) to form a first electrode on a substrate; depositing a self-assembling monolayer, SAM, layer over and aro...