ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,612, issued on June 17, was assigned to KEMIRA OYJ (Helsinki).
"Method and system for monitoring a process" was invented by Iiris Joensuu (Espoo, Finland), Marjatta Piironen (Espoo, Finland), Torsten Haverinen-Nielsen (Espoo, Finland) and Vesa-Matti Tikkala (Espoo, Finland).
According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a way to monitor a process (1). The invention utilizes explanation values. A ML model of the process is created. The ML model utilizes measurements from the process as inputs to the ML model and forms model outputs. The inputs are classified to groups in the. The explanation values are calculated for each input ...