US Patent Issued to KCTECH on Sept. 30 for "Cerium oxide abrasive particles and polishing slurry composition" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,428,584, issued on Sept. 30, was assigned to KCTECH Co. LTD. (Gyeonggi-do, South Korea).

"Cerium oxide abrasive particles and polishing slurry composition" was invented by Jung Hun Kim (Gyeonggi-do, South Korea), Jeong Gyu Lee (Gyeonggi-do, South Korea) and Hyo Jun Jang (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to cerium oxide abrasive particles and a polishing slurry composition, and more particularly, to cerium oxide abrasive particles comprising: an element cerium; and a modifier and satisfying the agglomeration ratios calculated from the relational expressions of the primary particle siz...