ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,472,532, issued on Nov. 18, was assigned to KCTECH Co. LTD. (Anseong-si, South Korea).
"Substrate treating apparatus and cleaning nozzle used therein" was invented by Geun Sik Yoon (Anseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a substrate processing apparatus and a cleaning nozzle for substrate processing included therein. More particularly, a substrate processing apparatus, including: a support for holding a disk-shaped substrate; and a cleaning nozzle for spraying a mixed fluid, in which liquid and gas are mixed, to a surface of the substrate in a slit shape through a slit-shaped discharge port to remove foreign...