US Patent Issued to KCTECH on Dec. 23 for "Cerium-based particle and polishing slurry composition including the same" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,503,622, issued on Dec. 23, was assigned to KCTECH Co. LTD. (Gyeonggi-do, South Korea).

"Cerium-based particle and polishing slurry composition including the same" was invented by Jeong Gyu Lee (Gyeonggi-do, South Korea), Hyo Jun Jang (Gyeonggi-do, South Korea) and Jun Ha Hwang (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a cerium-based particle and a polishing slurry composition including the same. The cerium-based particle may include a self-assembly of fine particles and an organic material. The cerium-based particle is a spherical ceria powder connected by a crystalline network formed by a self-assembly of a f...