US Patent Issued to Kateeva on Sept. 9 for "Methods for producing an etch resist pattern on a metallic surface" (Israeli Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,414,239, issued on Sept. 9, was assigned to Kateeva Inc. (Newark, Calif.).

"Methods for producing an etch resist pattern on a metallic surface" was invented by Moshe Frenkel (Jerusalem) and Nava Shpaisman (Kedumim, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and composition sets for forming etch-resist masks on a metallic surface are provided. The method may include depositing a first aqueous composition comprising a first reactive component onto a metallic layer of a substrate; depositing a second aqueous composition comprising a second reactive component on selected portions of the deposited first aqueous composition to form, from a...