US Patent Issued to Kateeva on April 8 for "Methods for producing an etch resist pattern on a metallic surface" (Israeli Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,270,111, issued on April 8, was assigned to Kateeva Inc. (Newark, Calif.).

"Methods for producing an etch resist pattern on a metallic surface" was invented by Nava Shpaisman (Kedumim, Israel) and Moshe Frenkel (Jerusalem).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface-activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one i...