ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,131, issued on May 13, was assigned to KAO Corp. (Tokyo).
"Method for removing biofilm" was invented by Kento Hosokawa (Wakayama, Japan), Masashi Chiba (Wakayama, Japan), Tetsuji Yamamoto (Wakayama, Japan) and Takanori Tanaka (Wakayama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is a method for removing a biofilm containing a metal and formed in a water system, wherein the biofilm is brought into contact with (a) a compound having a hydroxyl radical generation ability and (b) a reducing agent."
The patent was filed on April 28, 2020, under Application No. 17/604,683.
*For further information, including images, chart...