US Patent Issued to KALARK NANOSTRUCTURE SCIENCES on Aug. 26 for "Methods and systems for producing conformal thin films" (Pennsylvania, New York Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,398,469, issued on Aug. 26, was assigned to KALARK NANOSTRUCTURE SCIENCES INC. (Doylestown, Pa.).

"Methods and systems for producing conformal thin films" was invented by Alain E. Kaloyeros (Slingerlands, N.Y.) and Barry C. Arkles (Pipersville, Pa.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Thin film deposition procedures and systems are provided that consist of hybrid growth processes or integrated physical-chemical deposition processes that combine and unite the advantages of physical (i.e., sputtering) and chemical (i.e., CVD, ALD, MLD, SAM, and/or Click) deposition processes, while minimizing or eliminating their individual shortcomings and chal...