US Patent Issued to K-MAC TECHNOLOGY on Sept. 30 for "Wafer measurement system using time-of-flight medium-energy ion scattering signal" (South Korean, Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,440, issued on Sept. 30, was assigned to K-MAC TECHNOLOGY CORP. (Taipei, Taiwan).

"Wafer measurement system using time-of-flight medium-energy ion scattering signal" was invented by Yu-Chiang Pao (Taipei, Taiwan), Yao-Yu Chang (Taipei, Taiwan), Yuh-Yih Lu (Taipei, Taiwan), Kyu-Sang Yoo (Anyang-si, South Korea) and Soo-Bang Kim (Anyang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer measurement system using a time-of-flight medium-energy ion scattering (TOF-MEIS) signal is provided. The wafer measurement system is adaptable to the manufacturing process environment of each type of currently existing semiconductor wafers or is s...