ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,674, issued on May 27, was assigned to JX Advanced Metals Corp. (Tokyo).
"Sputtering target" was invented by Masayoshi Shimizu (Ibaraki, Japan), Yasuyuki Iwabuchi (Ibaraki, Japan) and Manami Masuda (Ibaraki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component."
The patent was filed on Sept. 23, 2022, under Application No. 17/951,234.
*For further information, including images, charts and tables,...