ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,898, issued on Sept. 16, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea).
"Substrate processing apparatus" was invented by Seung Youb Sa (Bucheon-si, South Korea), Kwang Su Park (Gwangju-si, South Korea), Ho Boem Her (Incheon, South Korea) and Chul Joo Hwang (Seongnam-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a chamber having a sidewall; a susceptor mounting a substrate inside the chamber, an upper dome covering an upper surface of the chamber and formed of a transparent dielectric material, and an antenna disposed on the upper dome to generate inductively coupled plasma. The ...