ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,547, issued on Oct. 7, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea).
"Gas supply apparatus for substrate processing apparatus" was invented by Se Whan Jin (Gwangju-si, South Korea), Jae Sung Roh (Gwangju-si, South Korea), Hong Min Yoon (Gwangju-si, South Korea), Hong Soo Yoon (Gwangju-si, South Korea), Youn Joo Jang (Gwangju-si, South Korea), Byoung Ha Cho (Gwangju-si, South Korea), Ji Hyun Cho (Gwangju-si, South Korea) and Chul Joo Hwang (Gwangju-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present inventive concept relates to a gas supply apparatus for a substrate processing apparatus, the gas supply apparatus com...