US Patent Issued to JUSUNG ENGINEERING on June 17 for "Substrate processing method" (South Korean Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,329, issued on June 17, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea).

"Substrate processing method" was invented by Ji Hoon Kim (Gwangju-Si, South Korea) and Chul Joo Hwang (Gwangju-Si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a substrate processing method, and more particularly, to a substrate processing method for removing an oxide film formed on a substrate. In accordance with an exemplary embodiment, a substrate processing method that processes a substrate loaded into a chamber, includes: supplying a nitrogen-containing gas to an inner space of a plasma generator disposed outside t...