ALEXANDRIA, Va., July 30 -- United States Patent no. 12,371,786, issued on July 29, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea).
"Substrate processing method" was invented by Il Hyong Cho (Gwangju-si, South Korea), Duck Ho Kim (Gwangju-si, South Korea) and Chul-Joo Hwang (Gwangju-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method which can supply gas to a plurality of process chamber through one gas supply unit, and supply different gases at the same time, thereby improving the uniformity of the thicknesses of thin films deposited in the respective chambers. The substrate processing method can perform a process in only one chamber by supplying gas to on...