US Patent Issued to JSW Aktina System on Dec. 9 for "Laser processing device and laser light monitoring method" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,491,582, issued on Dec. 9, was assigned to JSW Aktina System Co. Ltd. (Yokohama, Japan).

"Laser processing device and laser light monitoring method" was invented by Kenichi Ohmori (Tokyo), Suk-Hwan Chung (Tokyo), Ryosuke Sato (Tokyo) and Yuzaburo Ota (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A laser processing device and a laser processing method that are capable of forming a high-quality semiconductor film are provided. An ELA device (excimer laser annealing device) (1) includes a laser oscillator (10) that generates laser light for forming a polysilicon film by irradiating an amorphous silicon film over a substrate to be processed with the ...