US Patent Issued to JSR on Sept. 23 for "Radiation-sensitive resin composition and method for forming resist pattern" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,748, issued on Sept. 23, was assigned to JSR Corp. (Tokyo).

"Radiation-sensitive resin composition and method for forming resist pattern" was invented by Ken Maruyama (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A radiation-sensitive resin composition includes: a base resin comprising a structure unit having an acid-dissociable group; and a radiation-sensitive acid generator which comprises compounds represented by formula (2) and formula (3), and optionally a compound represented by formula (1). R1-R3 are each independently a group having a cyclic structure; X11-X32 are each independently a hydrogen atom, a fluorine atom, or a fluorinated...