US Patent Issued to JSR on May 27 for "Method for forming protective film, method for manufacturing patterned substrate, and composition" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,487, issued on May 27, was assigned to JSR Corp. (Tokyo).

"Method for forming protective film, method for manufacturing patterned substrate, and composition" was invented by Kazunori Takanashi (Tokyo), Hiroyuki Miyauchi (Tokyo), Nao Okumura (Tokyo), Tomoharu Kawazu (Tokyo) and Satoshi Dei (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a protective film includes directly or indirectly coating only a periphery of a substrate with a composition. The composition includes a compound having an aromatic ring, and a solvent. The solvent includes a first solvent having a normal boiling point of 156deg C. or higher and lower than 3...