US Patent Issued to JSR on March 25 for "Radiation-sensitive resin composition, method of forming resist pattern, and compound" (Japanese Inventor)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,653, issued on March 25, was assigned to JSR Corp. (Tokyo).

"Radiation-sensitive resin composition, method of forming resist pattern, and compound" was invented by Katsuaki Nishikori (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; a radiation-sensitive acid generator; and a compound represented by the following formula (1). In the following formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; and Xn+ represents a radiation-sensitive onium cation having a valency of n, wher...