ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,144, issued on Jan. 20, was assigned to JSR Corp. (Tokyo).
"Composition, method of producing substrate, and polymer" was invented by Hiroyuki Komatsu (Tokyo) and Motohiro Shiratani (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A composition includes a polymer and a solvent. The polymer includes a group (X) which is at least one selected from the group consisting of: a group including at least two cyano groups; a group including -B(OR)2; a group including -PO(OR)2; and a group including -P(OR)2. Each R independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably includes the gr...