US Patent Issued to JSR on April 1 for "Radiation-sensitive resin composition and method for forming resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., April 2 -- United States Patent no. 12,265,331, issued on April 1, was assigned to JSR Corp. (Tokyo).

"Radiation-sensitive resin composition and method for forming resist pattern" was invented by Ryuichi Nemoto (Tokyo), Kota Furuichi (Tokyo) and Hajime Inami (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A radiation-sensitive resin composition includes: a resin including a structural unit (A) represented by formula (1) and a structural unit (B) having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. R1 is a halogen atom-substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; X is -O- or -S-; La1 is a halogen atom-substitute...