ALEXANDRIA, Va., July 16 -- United States Patent no. 12,359,305, issued on July 15, was assigned to JOINSOLUTION Co. LTD. (South Korea).

"Deposition device having contact structure and deposition system having same" was invented by Sang Bin Lee (Seoul, South Korea) and Min Ho Kim (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present inventive concept relates to a deposition system including: a deposition device having a chamber, a seating plate located inside the chamber to seat a wafer, a magnet coupled to the underside of the seating plate, and a mask assembly located inside the chamber; and a transfer device having a load lock chamber for accommodating the wafer, an arm memb...