ALEXANDRIA, Va., March 26 -- United States Patent no. 12,258,665, issued on March 25, was assigned to JNK TECH (San Jose, Calif.).
"Substrate inspection system and a method of use thereof" was invented by Youngjin Choi (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "This application relates to a method of inspection and an inspection system for the film deposition process for substrates that includes glass and wafer. The inspection system includes multiple camera modules positioned in a load lock unit of a process chamber, such as the camera modules that can capture images of the substrate in the load lock. The images are analyzed by a control unit of the inspection system to determine the a...