US Patent Issued to JILIN UNIVERSITY on Oct. 7 for "Micro-nano impact indentation testing device and method based on cyclic refrigeration" (Chinese Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,072, issued on Oct. 7, was assigned to JILIN UNIVERSITY (Changchun, China).

"Micro-nano impact indentation testing device and method based on cyclic refrigeration" was invented by Zhichao Ma (Changchun, China), Zixin Guo (Changchun, China), Guoxiang Shen (Changchun, China), Jiazheng Sun (Changchun, China), Wei Zhang (Changchun, China), Hongcai Xie (Changchun, China), Shuai Tong (Changchun, China), Junming Xiong (Changchun, China), Wenyang Zhao (Changchun, China), Yicheng Li (Changchun, China), Boyi Kou (Changchun, China), Zaizheng Yang (Changchun, China), Chaofan Li (Changchun, China), Jiakai Li (Changchun, China), Hongwei Zhao (Changchun, China) and Luquan Ren (Changchun, China)....