US Patent Issued to JILIN UNIVERSITY on March 11 for "Rapid dot matrix micro-nano impact indentation testing system" (Chinese Inventors)

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,247,956, issued on March 11, was assigned to JILIN UNIVERSITY (Changchun, China).

"Rapid dot matrix micro-nano impact indentation testing system" was invented by Zhichao Ma (Changchun, China), Junming Xiong (Changchun, China), Guoxiang Shen (Changchun, China), Ziyi Wu (Changchun, China), Shuai Tong (Changchun, China), Zixin Guo (Changchun, China), Wei Zhang (Changchun, China), Hongcai Xie (Changchun, China), Jiazheng Sun (Changchun, China), Wenyang Zhao (Changchun, China), Zaizheng Yang (Changchun, China), Chaofan Li (Changchun, China), Yicheng Li (Changchun, China), Boyi Kou (Changchun, China), Jiakai Li (Changchun, China), Yifan Liu (Changchun, China), Hongwei Zhao (Changchun, Chin...