ALEXANDRIA, Va., March 26 -- United States Patent no. 12,258,676, issued on March 25, was assigned to Jiangsu Alpha-Semiconductor Equipment Co. Ltd. (Wuxi, China).
"Pre-heat ring and substrate processing device" was invented by Liu Ziqiang (Wuxi, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A pre-heat ring for a substrate processing device, which includes: a reaction chamber, a bearing disk, the pre-heat ring and a gas injection port. The bearing disk is arranged in the reaction chamber and supports a substrate; the pre-heat ring is arranged around the bearing disk; a supporting piece is arranged in the reaction chamber and supports the pre-heat ring; the gas injection port is formed in the reaction ...