ALEXANDRIA, Va., March 19 -- United States Patent no. 12,255,043, issued on March 18, was assigned to JEOL Ltd. (Tokyo).
"Scanning electron microscope and image generation method using scanning electron microscope" was invented by Takeshi Otsuka (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "An electron beam is irradiated on a specimen in a state where a negative voltage is applied to the specimen. The specimen is rotated to establish an optimum orientation of a specimen surface shape relative to an orientation of a detector having two detection surfaces disposed at rotational symmetric positions with respect to an optical axis of the electron beam taken as an axis of rotation, and an image is generat...