US Patent Issued to JEOL on March 18 for "Electron microscope and method of correcting aberration" (Japanese Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,255,041, issued on March 18, was assigned to JEOL Ltd. (Tokyo).

"Electron microscope and method of correcting aberration" was invented by Keito Aibara (Tokyo), Tomohiro Nakamichi (Tokyo), Shigeyuki Morishita (Tokyo), Motofumi Saito (Tokyo), Ryusuke Sagawa (Tokyo) and Fuminori Uematsu (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Prior to execution of primary correction, a first centering process, an in-advance correction of a particular aberration, and a second centering process are executed stepwise. In the first centering process and the second centering process, a ronchigram center is identified based on a ronchigram variation image, and is ...