US Patent Issued to JEOL on July 8 for "Aberration correcting device and electron microscope" (Japanese Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,827, issued on July 8, was assigned to JEOL Ltd. (Tokyo).

"Aberration correcting device and electron microscope" was invented by Shigeyuki Morishita (Tokyo) and Hidetaka Sawada (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An aberration correcting device includes a first multipole which generates a hexapole field; a second multipole which generates a hexapole field with a polarity opposite to a polarity of the hexapole filed generated by the first multipole; a third multipole which is disposed between the first multipole and the second multipole and generates an octupole field; a first transfer lens system disposed between the first multipole...