ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,525,431, issued on Jan. 13, was assigned to JEOL Ltd. (Tokyo).
"Aberration corrector and electron microscope" was invented by Shigeyuki Morishita (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "An aberration corrector includes a first multipole element for producing a hexapole field, a second multipole element for producing a hexapole field, and a transfer lens system disposed between the first and second multipole elements. The first and second multipole elements are arranged along an optical axis. At least one of the hexapole fields respectively produced by the first multipole element and the second multipole element varies in strength along the...