ALEXANDRIA, Va., Feb. 12 -- United States Patent no. 12,222,658, issued on Feb. 11, was assigned to JEOL Ltd. (Tokyo).
"Stage apparatus and electron beam lithography system" was invented by Hirofumi Miyao (Tokyo) and Noriyuki Kobayashi (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A stage apparatus includes a surface plate as well as a guide shaft fixedly secured to the surface plate, a drive member moving along the guide shaft, and a hydrostatic fluid bearing that forms fluid films in the gap portion between the guide shaft and the drive member. The apparatus further includes: a positional deviation detection section-for detecting a relative positional deviation which occurs between the guide shaft ...